Electron beam welding machine consists of electron gun, high-voltage power, vacuum unit, vacuum welding chamber, electrical control system, fixture and working station running system and etc. 电子束焊机由电子枪、高压电源、真空机组、真空焊接室、电气控制系统、工装夹具与工作台行走系统等部分组成。
The elementary exposure pattern of a variable rectangular electron beam exposure machine is a rectangle. 可变矩形电子束曝光机的基本曝光图形是矩形。
Foundation Treatment Design and Construction of Pavement Foundation of Wheel-rail-type Handle Beam Machine in Beam Field 梁场轮轨式提梁机走道基础地基处理设计与施工
Nal dual ion beam processing machine 多功能双离子束加工机
The results showed that if laser beam machine, focus system and material are determined, four major factors have influence on process quality. They are laser beam power, pulse duration, cutting velocity, gas pressure. 结果表明:在激光器、聚焦系统和材料确定后,激光功率、脉宽、切割速度、气体压力是影响加工质量的主要因素。
The design and analysis of electron optical system for electron beam welding machine 电子束焊接装置用电子光学系统的设计与分析
Electron beam lithography machine is the key instrument for mask making and research of nanometer device. 电子束曝光技术是掩模版制作和纳米器件研究的主要手段。
Errors and data processing of electron beam exposure machine 电子束曝光机的误差与数据处理
A Study On Magnetic Deflection System In Electron Beam Machine 电子束曝光机磁复合偏转系统的研究
Electron beam lithography machine is a large precise device used in research and development of micro electron industry and micro-fabrication. 电子束曝光机系统是微电子工业和微细加工研究与开发不可缺少的大型精密设备。
The distortion-correction memory for the variable shaped electron beam exposure machine is introduced in this paper. 本文介绍了可变矩形电子束曝光机用畸变修正存贮器。
Type EBW-4C Universal Electron Beam Welding Machine With Computer Control EBW&4C型微机控制通用电子束焊机的研制
Development of precision numericed controlled high vacuum electron beam welding machine 精密数控高真空电子束焊机的研制
METHODS: The BEAM-EEGs of 39 normal elderly people were examined by using the Concerto SEEG-16 channels BEAM machine ( Danmark). 方法:应用丹麦ConcertoSEEG-16首脑电地形图仪,对39例正常老人的BEAM-EEG作了检测。
A low energy, self-shielded electron beam machine for the surface coating curing of wood panel and gypseous plate was introduced. 本文初步描述了利用低能自屏蔽电子帘式加速器固化木器涂料和石膏板表层涂料的生产工艺。
Rotatable Crossed Molecular Beam Machine and Its Application in Cluster Dynamics Studies 束源转动的交叉分子束装置及其在分子簇动力学研究中的应用
The electrical control system of the 900 ton case roof beam bridging machine in this paper is designed to solve this problem. 本论文中900吨箱梁架桥机电气控制系统的设计就是为了解决这一问题而提出的。
The laser Positioning stage system with hoisting structure which is being developed is the main part of the Electron-beam Lithography Machine. 正在研制的激光定位吊装结构工作台系统是电子束曝光机的主要组成部分。
The constitution of the control system for laser positioning stage used in sub micron E beam exposure machine and the design of PID positioning and control system for automatic correction of the stage are presented in the paper. 系统介绍了亚微米电子束曝光机激光工件台控制系统的结构组成以及工件台自校正PID定位控制系统的设计。
The relationship between the principal trajectory of electron beam exposure and aberrations has been investigated in combined round magnetic lenses and deflection system of SDS 3 electron beam machine. The double passageway principle in scanning system is used. 以SDS3电子束曝光机的磁复合偏转系统为基础,以双通道扫描原理进行扫描,分析了像差与电子束主轨迹的关系。
Structure design of large electron beam welding machine with high or low vacuum 大型高低真空两用电子束焊机的结构设计
Meanwhile, Developed ionic beam machine with multiple functions for the ion implantation into the material of aero-bearing solved the problem of non-uniformity implantation on spherical surface. 同时,针对离子注入航空轴承而研制的离子束多功能机,解决了球面无法均匀注入的难题。
On the basis of the advantages of vacuum electron beam welding machine from domestic and abroad and the new structure design of the equipment, it was successfully developed. 它是在吸取国内外同类真空电子束焊机优点的基础上确立了新的结构方案而研制成功的。
The structure of the electron beam focusing and deflection system of electron beam exposure machine is analysed with computer aided design ( CAD). 并使用计算机辅助设计研究电子束曝光机聚焦偏转系统的结构。
Deflecting System and Moving Objective Lens in Electron Beam Exposure Machine 电子束曝光机偏转系统及可动物镜分析
CAD for the Combined Magnetic Lens and Magnetic ( or Electric) Deflection System in Electron Beam Lithography Machine 电子束曝光机磁透镜和磁、电偏转复合系统的机辅设计